Multi-ion-beam tool system is capable of providing a complete sub-10 nanometer nanofabrication and sub-nanometer imaging solution for industry, government, and academic research laboratories. An optional gallium focused ion beam (FIB) column can also be integrated. The ORION NanoFab system is based on Gas Field Ion Source (GFIS) technology. As a major enhancement to the existing helium ion microscope, the system also utilizes neon ions.
The neon ion beam offers precise machining and nanofabrication capabilities due to higher sputter yields in ion beam milling and faster resist exposure in ion beam lithography. The helium ion beam allows sub-10 nm nanofabrication as well as high resolution imaging capability in the same instrument. The optional state-of-the-art gallium FIB column allows massive material removal. Together this makes it a highly versatile nanofabrication and imaging platform.