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DualBeam system for complex device geometries

The dual beam Helios NanoLab 450 F1 combines an SEM (scanning electron microscope) for imaging and a FIB (focused ion beam) for milling and deposition. Dual beams also provide STEM imaging capability by adding a detector for collecting transmitted electrons below the sample. An increasingly important application of dual beam instruments is the preparation of the ultra thin samples required for TEM analysis. This need for high-resolution TEM analysis has grown dramatically in recent years as many devices structures have shrunk beyond the resolving power of SEM.


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